One-Step synthesis of nanosized Cu-Ag films using atmospheric pressure plasma jet

Thin films of copper-silver (Cu-Ag) composed of nanosized particles were successfully synthesised and deposited on glass and carbon substrates under various metal ratios in a single step using an atmospheric pressure plasma jet (APPJ) system. This rapid synthesis and deposition technique only requires very low power input (20 W) and rudimentary solutions of metal salt precursors and DI water without additives, pretreatment, or post-treatment process. Successful Cu-Ag alloying was observed, with excellent compositional and deposition area control. Strongly adherent films can be formed on conductive and non-conductive substrate, making APPJ an ideal and sustainable approach for large-scale deposition of multi-component thin metallic films. A comprehensive characterisation of Cu-Ag alloys deposited using APPJ and their potential use as electrocatalytic CO2 reduction catalysts is discussed.